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10.1063/5.0024588
2020-12-18
Nickel telluride vertically aligned thin film by radio-frequency magnetron sputtering for hydrogen evolution reaction
aip.org
© 2020 Author(s)
10.1063/5.0024588
https://doi.org/10.1063/5.0024588
VoR
doi:10.1063/5.0024588
APL Materials
application/pdf
AIP Publishing, LLC
Nickel telluride vertically aligned thin film by radio-frequency magnetron sputtering for hydrogen evolution reaction
Jeonghyeon Oh
Ho Jun Park
Arindam Bala
Hee-Soo Kim
Na Liu
Sooho Choo
Min Hyung Lee
Suk Jun Kim
Sunkook Kim
APL Mater. 2020.8:121104
2020-12-18
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10.1063/5.0024588
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